The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Feb. 15, 2013
Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventors:

Wataru Mori, Tokyo, JP;

Hiroyuki Ito, Tokyo, JP;

Yuko Sasaki, Tokyo, JP;

Hiromi Inada, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/28 (2006.01); H01J 37/05 (2006.01); H01J 37/244 (2006.01); H01J 37/09 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/05 (2013.01); H01J 37/244 (2013.01); H01J 37/09 (2013.01); H01J 2237/2801 (2013.01); H01J 2237/2806 (2013.01);
Abstract

The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.


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