The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Feb. 18, 2011
Applicants:
Kebing Wang, Shanghai, CN;
Jun YE, Shanghai, CN;
Jianyu LI, Shanghai, CN;
Inventors:
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 12/08 (2006.01); G06T 1/60 (2006.01); G06F 9/45 (2006.01); G06T 15/04 (2011.01); G09G 5/39 (2006.01);
U.S. Cl.
CPC ...
G06F 12/0875 (2013.01); G06F 12/0886 (2013.01); G06T 1/60 (2013.01); G06F 8/4442 (2013.01); G06F 2212/302 (2013.01); G06F 2212/455 (2013.01); G06F 2212/601 (2013.01); G06T 15/04 (2013.01); G09G 5/39 (2013.01);
Abstract
Techniques are described to configure a cache line structure based on attributes of a draw call and access direction of a texture. Attributes of textures (e.g., texture format and filter type), samplers, and shaders used by the draw call can be considered to determine the line size of a cache. Access direction can be considered to reduce the number of lines that are used to store texels required by a sample request.