The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Mar. 23, 2012
Applicants:
Tsunemitsu Torigoe, Cheonan-si, KR;
Hong Suk Yoo, Anyang-si, KR;
Chang Hoon Kim, Asan-si, KR;
Inventors:
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); G03F 7/7035 (2013.01); G03F 7/70791 (2013.01);
Abstract
The present invention relates to a method of controlling a light exposure apparatus including an exposure beam generator equipped with a prism or a bend mirror and a vacuum chamber through which light generated in the exposure beam generator passes. The method includes, generating an exposure beam; measuring a deviation of a center of the exposure beam from a reference line in the vacuum chamber; and adjusting the prism or the bend mirror in the exposure beam generator to adjust the center of the exposure beam when the center of the exposure beam is misaligned with the reference line.