The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Jun. 06, 2012
Carl Chartier, Manchester, NH (US);
Parthasarathy Santhanaraghavan, Nashua, NH (US);
Andriy Andrukhiv, Hollis, NH (US);
Dave Lackey, Merrimack, NH (US);
Bhuvaragasamy G. Ravi, Nashua, NH (US);
Carl Chartier, Manchester, NH (US);
Parthasarathy Santhanaraghavan, Nashua, NH (US);
Andriy Andrukhiv, Hollis, NH (US);
Dave Lackey, Merrimack, NH (US);
Bhuvaragasamy G. Ravi, Nashua, NH (US);
Abstract
Systems and methods are provided to promote uniform thermal environment to feedstock material (e.g., silicon) in a crucible of a crystal growth apparatus are provided herein. More specifically, a heating system may be arranged in the crystal growth apparatus so as to include at least a first and second heating element which are configured to distribute heat axisymmetrically to the feedstock material and the second heating element that is configured to distribute heat symmetrically to the feedstock material to thereby provide uniform heat distribution to the feedstock material in the crucible to allow for increased consistency in crystal ingot quality.