The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Jun. 03, 2014
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Michael P. Toben, Smithtown, NY (US);
Robert K. Barr, Shrewsbury, MA (US);
Corey O'Connor, Oakham, MA (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01); C09K 13/00 (2006.01); C09K 13/02 (2006.01); A01N 35/08 (2006.01); A01N 43/28 (2006.01); C07D 275/04 (2006.01); C23C 18/40 (2006.01); C23C 18/38 (2006.01); H01L 31/0236 (2006.01); G02B 1/111 (2015.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01); A01N 35/08 (2013.01); A01N 43/28 (2013.01); C07D 275/04 (2013.01); C09K 13/00 (2013.01); C09K 13/02 (2013.01); C23C 18/38 (2013.01); C23C 18/40 (2013.01); G02B 1/111 (2013.01); H01L 31/02363 (2013.01); Y02E 10/50 (2013.01);
Abstract
Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include hydantoin compounds and derivatives thereof in combination with alkoxylated glycols to inhibit the formation of flat areas between pyramid structures to improve the light absorption.