The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Mar. 23, 2012
Applicants:

Yukio Watanabe, Hiratsuka, JP;

Miwa Igarashi, Oyama, JP;

Masato Moriya, Oyama, JP;

Hiroaki Nakarai, Hiratsuka, JP;

Inventors:

Yukio Watanabe, Hiratsuka, JP;

Miwa Igarashi, Oyama, JP;

Masato Moriya, Oyama, JP;

Hiroaki Nakarai, Hiratsuka, JP;

Assignee:

GIGAPHOTON INC., Tochigi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H05G 2/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/003 (2013.01); G03F 7/70033 (2013.01); H05G 2/008 (2013.01);
Abstract

An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.


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