The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Jan. 08, 2014
Applicants:

Jaeduk Lee, Seongnam-si, KR;

Youngwoo Park, Seoul, KR;

Jintaek Park, Hwasung-si, KR;

Dohyun Lee, Hwasung-si, KR;

Kohji Kanamori, Seoul, KR;

Inventors:

Jaeduk Lee, Seongnam-si, KR;

Youngwoo Park, Seoul, KR;

Jintaek Park, Hwasung-si, KR;

Dohyun Lee, Hwasung-si, KR;

Kohji Kanamori, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 27/105 (2006.01); H01L 27/115 (2006.01); G11C 16/10 (2006.01); G11C 16/14 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1052 (2013.01); G11C 16/10 (2013.01); G11C 16/14 (2013.01); H01L 27/11524 (2013.01); H01L 27/11556 (2013.01);
Abstract

Provided are three-dimensional semiconductor devices and methods of operating the same. The three-dimensional semiconductor devices may include active patterns arranged on a substrate to have a multi-layered and multi-column structure and drain patterns connected to respective columns of the active patterns. The methods may include a layer-selection step connecting a selected one of layers of the active patterns selectively to the drain patterns. For example, the layer-selection step may be performed in such a way that widths of depletion regions to be formed in end-portions of the active patterns are differently controlled depending on to a height from the substrate.


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