The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Jan. 31, 2014
Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

David Timberlake, Lexington, MA (US);

Mark R. Amato, South Hamilton, MA (US);

Nathan Roth, Peabody, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/00 (2006.01); H01J 37/317 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); H01J 37/244 (2013.01); H01J 2237/0213 (2013.01); H01J 2237/24495 (2013.01); H01J 2237/24535 (2013.01);
Abstract

A defining aperture plate having at least two differently sized apertures is used in conjunction with at least two charge collectors. Because of the difference in aperture width, the two charge collectors receive different amounts of ions, where the amount is proportional to the associated aperture width. By monitoring the ratio of the charge collected by the first charge collector to the charge collected by the second collector, the amount of erosion can be monitored and optionally compensated for.


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