The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Apr. 21, 2014
Applicant:

Nuflare Technology, Inc., Kanagawa, JP;

Inventors:

Yu Asami, Shizuoka, JP;

Michihiro Kawaguchi, Shizuoka, JP;

Assignee:

NUFLARE TECHNOLOGY, INC., Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); H01J 37/02 (2006.01); H01J 37/317 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/026 (2013.01); H01J 37/3002 (2013.01); H01J 37/3174 (2013.01);
Abstract

A mask cover according to one embodiment of the present invention comprises a frame body having an opening at the center, a conductive earth plate installed on the frame body such that its end protrudes into the opening of the frame body, an earth pin provided on the end of the earth plate and electrically connected to the earth plate, and a conductive cover part surrounding the earth pin such that the tip end of the earth pin protrudes and a gap is present between the cover part and the earth pin.


Find Patent Forward Citations

Asami, Yu. (2016). Mask cover, charged particle beam drawing apparatus and charged particle beam drawing method (U.S. Patent No. 9299531). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9299531

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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