The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Jul. 10, 2014
Applicant:

Synopsys Inc., Mountain View, CA (US);

Inventor:

Jianfeng Luo, Foster City, CA (US);

Assignee:

Synopsys Inc., Mountain View, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01);
Abstract

A method, system or computer usable program product for preventing odd cycles caused by design modifications to a double patterning layout including utilizing a processor to identify a set of double patterning cycles in the layout for storage in a memory; receiving a set of design modifications to the layout; utilizing the processor to identify from the set of double patterning cycles a subset of double patterning cycles affected by the set of design modifications; utilizing the processor to identify from the set of design modifications a subset of design modifications which may cause odd cycles in the subset of double patterning cycles; and providing a notification of the subset of design modifications.


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