The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Aug. 08, 2014
Applicant:

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Aijun Zeng, Shanghai, CN;

Longhai Liu, Shanghai, CN;

Linglin Zhu, Shanghai, CN;

Huijie Huang, Shanghai, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01); G01N 21/21 (2006.01); G01M 11/02 (2006.01); G01J 9/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/21 (2013.01); G01J 9/00 (2013.01); G01M 11/02 (2013.01); G01J 2004/005 (2013.01); G01N 2021/216 (2013.01);
Abstract

Device and method for measuring phase retardation distribution and fast axis azimuth angle distribution of birefringence sample in real time. The device consists of a collimating light source, a circular polarizer, a diffractive beam-splitting component, a quarter-wave plate, an analyzer array, a charge coupled device (CCD) image sensor and a computer with an image acquisition card. The method can measure the phase retardation distribution and the fast axis azimuth angle distribution of the birefringence sample in real time and has large measurement range. The measurement result is immune to the light-intensity fluctuation of the light source.


Find Patent Forward Citations

Loading…