The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

May. 02, 2014
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Elmar Falck, Hohenbrunn, DE;

Wolfgang Roesener, Ottobrunn, DE;

Hans Peter Felsl, Munich, DE;

Andre Stegner, Munich, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 29/778 (2006.01); H01L 29/74 (2006.01); H01L 29/739 (2006.01); H01L 21/761 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0623 (2013.01); H01L 21/761 (2013.01); H01L 29/7393 (2013.01); H01L 29/74 (2013.01); H01L 29/778 (2013.01); H01L 29/78 (2013.01);
Abstract

A semiconductor device has a semiconductor body with bottom and top sides and a lateral surface. An active semiconductor region is formed in the semiconductor body and an edge region surrounds the active semiconductor region. A first semiconductor zone of a first conduction type is formed in the edge region. An edge termination structure having at least N field limiting structures is formed in the edge region. Each of the field limiting structures has a field ring and a separation trench formed in the semiconductor body, where N is at least 1. Each of the field rings has a second conduction type, forms a pn-junction with the first semiconductor zone and surrounds the active semiconductor region. For each of the field limiting structures, the separation trench of that field limiting structure is arranged between the field ring of that field limiting structure and the active semiconductor region.


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