The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Oct. 23, 2012
Maolin Long, Cupertino, CA (US);
Alex Paterson, San Jose, CA (US);
Ricky Marsh, San Ramon, CA (US);
Ying Wu, Dublin, CA (US);
John Drewery, Santa Clara, CA (US);
Maolin Long, Cupertino, CA (US);
Alex Paterson, San Jose, CA (US);
Ricky Marsh, San Ramon, CA (US);
Ying Wu, Dublin, CA (US);
John Drewery, Santa Clara, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.