The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Aug. 29, 2014
Asml Netherlands B.v., Veldhoven, NL;
David Bessems, Eindhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Marcus Johannes Van Der Zanden, Boekel, NL;
Cornelius Maria Rops, Waalre, NL;
Paul Willems, Eindhoven, NL;
Jimmy Matheus Wilhelmus Van De Winkel, Kessel, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.