The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9291892 B1

Date of Patent:

Mar. 22, 2016

Filed:

Jun. 06, 2014

Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition

Applicant:

Fujifilm Corporation, Minato-ku, Tokyo, JP;

Inventors:

Akinori Shibuya, Haibara-gun, JP;

Kaoru Iwato, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Anca Eoff

Int. Cl.

CPC ...

G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01);

U.S. Cl.

CPC ...

G03F 7/004 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01);

Abstract

Disclosed are an actinic ray-sensitive or radiation-sensitive resin composition including (A) a compound capable of generating an acid by irradiation of actinic rays or radiation, and (B) a resin of which solubility in an alkali developer increases by being decomposed by the action of an acid, and, a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the composition, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains at least one type of a specific compound represented by General Formula (A-I) and at least one type of a specific compound represented by General Formula (A-II) as the compound (A).

Find Patent Forward Citations

Shibuya, Akinori. (2016). Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition (U.S. Patent No. 9291892). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9291892

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