The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Mar. 15, 2013
Hitachi High-tech Science Corporation, Tokyo, JP;
Xin Man, Tokyo, JP;
Atsushi Uemoto, Tokyo, JP;
Abstract
In a sample observation method, a sample stage is placed at a first tilt angle with respect to a charged particle beam, and an observation surface of a sample is irradiated with the charged particle beam to acquire a first charged particle image. The sample stage is then tilted to a second tilt angle different from the first tilt angle about a first sample stage axis, and the observation surface is again irradiated with the charged particle beam to acquire a second charged particle image. The sample stage is tilted to a tilt angle at which an area of the observation surface in the acquired charged particle image is the larger of the first charged particle image and the second charged particle image. The observation surface is then irradiated with the charged particle beam to observe the observation surface.