The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2016

Filed:

Oct. 01, 2014
Applicant:

Cadence Design Systems, Inc., San Jose, CA (US);

Inventors:

Arnold Ginetti, Antibes, FR;

Vikas Kohli, Noida, IN;

Taranjit Singh Kukal, Delhi, IN;

Assignee:

Cadence Design Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5022 (2013.01); G06F 2217/04 (2013.01); G06F 2217/08 (2013.01); G06F 2217/38 (2013.01); G06F 2217/40 (2013.01); G06F 2217/74 (2013.01);
Abstract

Disclosed are techniques to analyze multi-fabric designs. These techniques generate a cross-fabric analysis model by at least identifying first design data in a first design fabric of a multi-fabric electronic design using a first session of a first electronic design automation (EDA) tool, update the cross-fabric simulation model by at least identifying second design data in a second design fabric using a second session of a second EDA tool, and determine analysis results for the multi-fabric electronic design using at least the cross-fabric simulation model. Analysis results may be determined using parasitic, electrical, or performance information. Various EDA tools access their respective native design data in their respective domains or design fabrics and have no access to or visibility of non-native design data while these techniques automatically cross the boundaries between multiple design fabrics to accomplish the tasks of analyzing multi-fabric electronic designs or displaying analysis results therefor.


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