The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
May. 29, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;
David Deckers, Shilde, BE;
Sami Musa, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01D 5/34 (2006.01); G01B 9/02 (2006.01); G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); G01B 9/02 (2013.01); G01B 11/272 (2013.01); G01D 5/344 (2013.01); G03F 9/7046 (2013.01); G03F 9/7088 (2013.01);
Abstract
An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.