The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2016

Filed:

Apr. 02, 2013
Applicant:

Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;

Inventors:

Takashi Oda, Ibaraki, JP;

Naohide Takamoto, Ibaraki, JP;

Takeshi Matsumura, Ibaraki, JP;

Assignee:

NITTO DENKO CORPORATION, Ibaraki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C09D 171/08 (2006.01); H01L 23/00 (2006.01); H01L 21/78 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
C09D 171/08 (2013.01); H01L 21/78 (2013.01); H01L 23/3164 (2013.01); H01L 23/562 (2013.01); H01L 23/3114 (2013.01); H01L 2924/0002 (2013.01); Y10T 428/265 (2015.01); Y10T 428/31511 (2015.04);
Abstract

The present invention aims to provide a film for forming a protective layer that is capable of preventing cracks in a low dielectric material layer of a semiconductor wafer while suppressing an increase in the number of steps in the manufacture of a semiconductor device. This object is achieved by a film for forming a protective layer on a bumped wafer in which a low dielectric material layer is formed, including a support base, an adhesive layer, and a thermosetting resin layer, laminated in this order, wherein the melt viscosity of the thermosetting resin layer is 1×10Pa·S or more and 2×10Pa·S or less, and the shear modulus of the adhesive layer is 1×10Pa or more and 2×10Pa or less, when the thermosetting resin layer has a temperature in a range of 50 to 120° C.


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