The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9274418 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 01, 2016

Filed:

Mar. 30, 2010
Applicants:

Nikolay Iosad, Geldrop, NL;

Pascale Anne Maury, Veldhoven, NL;

Inventors:

Nikolay Iosad, Geldrop, NL;

Pascale Anne Maury, Veldhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B27N 3/18 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

An imprint lithography apparatus is disclosed that includes a first imprint template provided with pattern recesses and a second imprint template provided with pattern recesses, wherein the pattern recesses of the first imprint template are configured to form features on a substrate which interconnect laterally with features formed by the pattern recesses of the second imprint template, and wherein the pattern recesses of the second imprint template have a critical dimension which is three or more times greater than the critical dimension of the pattern recesses of the first imprint template.


Find Patent Forward Citations

Iosad, Nikolay. (2016). Imprint lithography apparatus and method (U.S. Patent No. 9274418). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9274418

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