The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Dec. 04, 2013
Applicant:
Epistar Corporation, Hsinchu, TW;
Inventors:
Chien-Kai Chung, Hsinchu, TW;
Ya Lan Yang, Hsinchu, TW;
Ting-Chia Ko, Hsinchu, TW;
Tsun-Kai Ko, Hsinchu, TW;
Jung-Min Hwang, Hsinchu, TW;
Schang-Jing Hon, Hsinchu, TW;
De-Shan Kuo, Hsinchu, TW;
Chien-Fu Shen, Hsinchu, TW;
Ta-Cheng Hsu, Hsinchu, TW;
Min-Hsun Hsieh, Hsinchu, TW;
Assignee:
EPISTAR CORPORATION, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 33/00 (2010.01); H01L 21/02 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
H01L 33/005 (2013.01); H01L 21/02057 (2013.01); H01L 21/3043 (2013.01); H01L 33/0095 (2013.01);
Abstract
A method of manufacturing a light-emitting device comprising the steps of cutting a substrate by a laser beam to form a cavity in the substrate and generate a by-product directly on the substrate by the cutting, and removing the by-product by a chemical solution containing an acid under a predetermined cleaning temperature.