The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2016

Filed:

Feb. 20, 2014
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Kai Frohberg, Niederau, DE;

Marco Lepper, Dresden, DE;

Katrin Reiche, Goltzscha, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/78 (2006.01); H01L 29/417 (2006.01); H01L 23/485 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7833 (2013.01); H01L 21/76805 (2013.01); H01L 21/76814 (2013.01); H01L 21/76843 (2013.01); H01L 23/485 (2013.01); H01L 29/4175 (2013.01); H01L 2924/00 (2013.01); H01L 2924/0002 (2013.01);
Abstract

When forming semiconductor devices with contact plugs comprising protection layers formed on sidewalls of etch stop layers to reduce the risk of shorts, the protection layers may be formed by performing a sputter process to remove material from a contact region and redeposit the removed material on the sidewalls of the etch stop layers.


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