The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Mar. 13, 2013
Nichias Corporation, Tokyo, JP;
Hiroshi Makabe, Tokyo, JP;
Hiroki Nakamura, Tokyo, JP;
Junya Satoh, Tokyo, JP;
Isami Abe, Tokyo, JP;
Akihiro Nakashima, Tokyo, JP;
NICHIAS CORPORATION, Tokyo, JP;
Abstract
A holding material for gas treatment device, gas treatment device, and methods for those achieve proper control of a frictional resistance between the holding material and a casing. A method of treating a gas with a gas treatment device including a treatment structure, a casing made of a metal for housing the treatment structure and a holding material made of inorganic fibers placed between the treatment structure and the casing, the method including: placing an organic polymer between the holding material and the casing so that the organic polymer is brought into contact with an outer surface of the holding material and an inner surface of the casing during treatment of the gas; and treating the gas under a condition that a temperature of the casing is equal to or higher than a softening temperature of the organic polymer and lower than a decomposition temperature of the organic polymer.