The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Apr. 04, 2013
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Kentaro Harada, Sunnyvale, CA (US);
Goji Wakamatsu, Sunnyvale, CA (US);
Assignee:
JSR CORPORATION, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 15/00 (2006.01); B01D 39/00 (2006.01); C02F 1/42 (2006.01); C08K 5/07 (2006.01); B01J 20/26 (2006.01); B01J 20/282 (2006.01); B01J 20/32 (2006.01); B24B 1/00 (2006.01); B24C 1/00 (2006.01); B24B 7/19 (2006.01); B24B 7/30 (2006.01); B24B 57/00 (2006.01); C08K 5/103 (2006.01);
U.S. Cl.
CPC ...
B01D 15/00 (2013.01); B01J 20/261 (2013.01); B01J 20/267 (2013.01); B01J 20/282 (2013.01); B01J 20/327 (2013.01); C08K 5/07 (2013.01); C08K 5/103 (2013.01);
Abstract
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.