The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Nov. 08, 2013
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Dan B. Millward, Boise, ID (US);
Donald L. Westmoreland, Boise, ID (US);
Gurtej S. Sandhu, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/02 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01); G03F 7/00 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/02 (2013.01); B81C 1/00031 (2013.01); B82Y 30/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/265 (2013.01); B81C 2201/0149 (2013.01); B81C 2201/0198 (2013.01); Y10T 428/24 (2015.01); Y10T 428/2438 (2015.01); Y10T 428/24149 (2015.01); Y10T 428/24174 (2015.01);
Abstract
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.