logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9256068 B1

PDFFull Text
Date of Patent:
Feb. 09, 2016

Filed:

Jul. 23, 2014

Spherical aberration corrector, method of spherical aberration correction, and charged particle beam instrument

Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Hidetaka Sawada, Tokyo, JP;

Yu Jimbo, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:

The Webb Law Firm

Primary Examiner:

Loha Ben

Int. Cl.
CPC ...
G02B 27/14 (2006.01); H01J 3/14 (2006.01); H01J 3/26 (2006.01); G02B 27/00 (2006.01); H01J 3/12 (2006.01); H01J 37/05 (2006.01); H01J 37/147 (2006.01); H01J 37/153 (2006.01); H01J 37/28 (2006.01); G21K 1/08 (2006.01); G01N 23/20 (2006.01); G02B 27/42 (2006.01); H01J 3/04 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0037 (2013.01); G01N 23/20 (2013.01); G21K 1/08 (2013.01); H01J 3/12 (2013.01); H01J 3/26 (2013.01); H01J 37/05 (2013.01); H01J 37/147 (2013.01); H01J 37/1472 (2013.01); H01J 37/153 (2013.01); H01J 37/28 (2013.01); G02B 27/42 (2013.01); G02B 27/4205 (2013.01); H01J 3/04 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01);
Abstract

A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector () is for use with a charged particle beam instrument () for obtaining the image and the diffraction pattern and has a hexapole field generating portion () for producing plural stages of hexapole fields, an octopole field superimposing portion () for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion () for deflecting a charged particle beam.

Find Patent Forward Citations

Loading…