The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Mar. 30, 2012
Donny Young, Cupertino, CA (US);
Alan Ritchie, Menlo Park, CA (US);
Muhammad Rasheed, San Jose, CA (US);
Keith A. Miller, Mountain View, CA (US);
Donny Young, Cupertino, CA (US);
Alan Ritchie, Menlo Park, CA (US);
Muhammad Rasheed, San Jose, CA (US);
Keith A. Miller, Mountain View, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A processing system may include a target having a central axis normal thereto; a source distribution plate having a target facing side opposing a backside of the target, wherein the source distribution plate includes a plurality of first features such that a first distance of a first radial RF distribution path along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path along the given first diameter; and a ground plate opposing a target opposing side of the source distribution plate and having a plurality of second features disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path along the given second diameter.