The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Dec. 27, 2011
Bart Scholte Von Mast, Azmoos, CH;
Wolfgang Rietzler, Bludenz, AT;
Rogier Lodder, Bad Ragaz, CH;
Rolf Bazlen, Rorschach, CH;
Daniel Rohrer, Mels, CH;
Bart Scholte Von Mast, Azmoos, CH;
Wolfgang Rietzler, Bludenz, AT;
Rogier Lodder, Bad Ragaz, CH;
Rolf Bazlen, Rorschach, CH;
Daniel Rohrer, Mels, CH;
Oerlikon Advanced Technologies AG, Balzers, LI;
Abstract
A vacuum treatment apparatus and method for manufacturing has a plurality of treatment chambers for treating workpieces, in particular silicon wafers, a transfer chamber attached to the treatment chambers communicating via respective openings and having handling zones located adjacent to each of the treatment chambers. A workpiece carrier is arranged within the transfer chamber and configured to transfer the workpieces between the handling zones, and one or more handlers for moving the workpieces between the handling zones and the treatment chambers. The transfer chamber is ring-shaped about an axis and the openings have opening substantially parallel thereto. This way, forces on the transfer chamber are redirected to a large support structure and thus, a cost-effective, light and still rigid mechanical construction can be achieved.