The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2016

Filed:

Oct. 13, 2011
Applicants:

Hyun-ki Lee, Daegu, KR;

Dal-an Kwon, Gunpo-si, KR;

Jeong-yul Jeon, Seongnam-si, KR;

Inventors:

Hyun-ki Lee, Daegu, KR;

Dal-An Kwon, Gunpo-si, KR;

Jeong-Yul Jeon, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 11/02 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
G01C 11/02 (2013.01); G01B 11/0608 (2013.01);
Abstract

A measurement apparatus for measuring a substrate, on which a measurement object is formed, and a correction method of the same is shown. The correction method includes measuring a reference phase by measuring a phase of a substrate for measuring the reference phase by using an image-capture part, acquiring a tilted pose of a reference plane of the measured reference phase to an image plane of the image-capture part, and calculating a height that is required to correct the reference plane with regard to the image-capture part based on the tilted pose. Therefore, based on a tilted pose of a reference phase in order to correct a reference plane being a reference of measuring a height, a measurement credibility of the measurement object may be improved.


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