The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Feb. 13, 2012
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Luisa Bozano, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Luisa Bozano, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A polymer comprising recurring units having an acid-eliminatable group on a side chain and aromatic ring-bearing cyclic olefin units is used to formulate a chemically amplified negative resist composition. Any size shift between the irradiated pattern and the formed resist which can arise in forming a pattern including isolated feature and isolated space portions is reduced, and a high resolution is obtained.