The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Jun. 15, 2012
Dai Shiota, Kawasaki, JP;
Mayumi Kuroko, Kawasaki, JP;
Kunihiro Noda, Kawasaki, JP;
Yoshinori Tadokoro, Kawasaki, JP;
Dai Shiota, Kawasaki, JP;
Mayumi Kuroko, Kawasaki, JP;
Kunihiro Noda, Kawasaki, JP;
Yoshinori Tadokoro, Kawasaki, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Abstract
A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, Rand Reach independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. Rand Rmay be bonded to form a ring structure and may contain a hetero atom bond. Rindicates a single bond or an organic group. Rto Reach independently indicate a hydrogen atom, an organic group, etc., but Rand Rare never hydroxyl groups. Rindicates a hydrogen atom or an organic group.