The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Jul. 24, 2013
Air Products and Chemicals, Inc., Allentown, PA (US);
Heather Regina Bowen, Vista, CA (US);
Jianheng Li, Breinigsville, PA (US);
Mark Leonard O'Neill, San Marcos, CA (US);
Manchao Xiao, San Diego, CA (US);
Andrew David Johnson, Doylestown, PA (US);
Xinjian Lei, Vista, CA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
Methods for forming non-oxygen containing silicon-based films, that contain >50 atomic % of silicon, are provided herein. In one aspect, the silicon-based films have a composition SixCyNz wherein x is about 51 to 100, y is 0 to 49, and z is 0 to 50 atomic weight (wt.) percent (%) as measured by XPS. In one embodiment, the non-oxygen silicon-based films were deposited using at least one organosilicon precursor having at least two SiHgroups with at least one Clinkage between silicon atoms such as 1,4-disilabutane.