The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2016
Filed:
Dec. 28, 2011
Daniel J. Riggs, San Diego, CA (US);
Daniel J. Riggs, San Diego, CA (US);
Cymer, LLC, San Diego, CA (US);
Abstract
A method and system for performing injects of halogen gas into the chambers of a two chamber gas discharge laser such as a MOPA excimer laser for allowing operation of the laser within acceptable parameters and compensating for ageing effects without the necessity of performing refills is described. A parameter reflecting efficiency of the laser is measured, and the change in the parameter with respect to the length of laser operation is estimated. The change in the parameter with respect to the pressure in one of the chambers is also measured. At a given time, the total change in the value of the parameter is estimated, and from this change in pressure that is needed to reverse the change in the value of the parameter is calculated. The pressure in the chamber is then changed to correct for the amount of time that the laser has been in operation.