The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9240342 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 19, 2016

Filed:

Jul. 17, 2013
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Ajey P. Jacob, Albany, NY (US);

Murat K. Akarvardar, Saratoga Springs, NY (US);

Jody Fronheiser, Delmar, NY (US);

Witold P. Maszara, Morgan Hill, CA (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76224 (2013.01); H01L 29/66628 (2013.01); H01L 27/1203 (2013.01); H01L 29/66765 (2013.01); H01L 29/785 (2013.01); H01L 29/7848 (2013.01); H01L 29/7851 (2013.01);
Abstract

Various methods are disclosed herein for forming alternative fin materials that are in a stable or metastable condition. In one case, a stable replacement fin is grown to a height that is greater than an unconfined stable critical thickness of the replacement fin material and it has a defect density of 10defects/cmor less throughout its entire height. In another case, a metastable replacement fin is grown to a height that is greater than an unconfined metastable critical thickness of the replacement fin material and it has a defect density of 10defects/cmor less throughout at least 90% of its entire height.


Find Patent Forward Citations

Jacob, Ajey. (2016). Methods of forming replacement fins for a finfet semiconductor device by performing a replacement growth process (U.S. Patent No. 9240342). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9240342

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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