The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2016
Filed:
Jan. 20, 2011
Yoshiaki Kurokawa, Yokohama, JP;
Koichi Hamada, Yokohama, JP;
Nobuo Kobayashi, Yokohama, JP;
Yuji Nagashima, Yokohama, JP;
Yoshiaki Kurokawa, Yokohama, JP;
Koichi Hamada, Yokohama, JP;
Nobuo Kobayashi, Yokohama, JP;
Yuji Nagashima, Yokohama, JP;
SHIBAURA MECHATRONICS CORPORATION, Yokohama-shi, JP;
Abstract
[Problem] To provide a substrate treatment device which can more efficiently heat and more efficiently use a treatment solution to treat the surface of a plate-shaped substrate. [Solution] A substrate treatment device which is provided with a treatment solution feed mechanismand feeds a treatment solution S to the surface of a plate-shaped substrate that is held on the substrate holding partand which uses the treatment solution S to treat the surface of the plate-shaped substrate, which substrate treatment device has a treatment solution holding platewhich is arranged facing the surface of the plate-shaped substratethat is held at the substrate holding part, across a predetermined distance, and which holds the treatment solution with the surface of the plate-shaped substrateand a heating partwhich contacts a predetermined region of the treatment solution holding plate, including a position corresponding to the axis of rotation of the substrate holding part, to heat the predetermined region and which treatment solution feed mechanism feeds the treatment solution S to the clearance between the surface of the plate-shaped substratewhich rotates together with the substrate holding partand the treatment solution holding platewhich is heated by the heating part