The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2016
Filed:
Apr. 05, 2013
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Xianzhao Peng, Milpitas, CA (US);
Mark Shi Wang, San Ramon, CA (US);
Grace Hsiu-Ling Chen, Los Gatos, CA (US);
Assignee:
KLA-Tencor Corp., Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01N 21/21 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8806 (2013.01); G01N 21/21 (2013.01); G01N 21/9501 (2013.01); G01N 2021/8848 (2013.01);
Abstract
Methods and systems for variable polarization wafer inspection are provided. One system includes one or more polarizing components position in one or more paths of light scattered from a wafer and detected by one or more channels of an inspection system. The polarizing component(s) are configured to have detection polarization(s) that are selected from two or more polarization settings for the polarizing component(s).