The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2016
Filed:
Feb. 06, 2012
Christophe Pomarede, Vaterstetten, DE;
Eric Shero, Phoenix, AZ (US);
Mohith Verghese, Phoenix, AZ (US);
Jan Willem Maes, Leuven, BG;
Chang-gong Wang, Chandler, AZ (US);
Christophe Pomarede, Vaterstetten, DE;
Eric Shero, Phoenix, AZ (US);
Mohith Verghese, Phoenix, AZ (US);
Jan Willem Maes, Leuven, BG;
Chang-Gong Wang, Chandler, AZ (US);
ASM IP HOLDING B.V., Almere, NL;
Abstract
A vapor deposition method and apparatus including at least two vessels containing a same first source chemical. A controller is programmed to simultaneously pulse to the reaction space doses or pulses of a gas from the vessels, each of the doses having a substantially consistent concentration of the first source chemical. The apparatus may also include at least two vessels containing a same second source chemical. The controller can be programmed to simultaneously pulse to the reaction space doses or pulses of a gas from the vessels containing the second source chemical, each of the doses having a substantially consistent concentration of the second source chemical. The second source chemical can be pulsed to the reaction space after the reaction space is purged of an excess of the first source chemical.