The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2016
Filed:
Mar. 11, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Wilfried Clauss, Tuebingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A method for the production of a mirror element () that has a reflective coating () for the EUV wavelength range and a substrate (). The substrate () is pre-compacted by hot isostatic pressing, and the reflective coating () is applied to the pre-compacted substrate (). In the method, either the pre-compacting of the substrate () is performed until a saturation value of the compaction of the substrate () by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate () is irradiated, preferably homogeneously, with ions () and/or with electrons in a surface region () in which the coating () has been or will be applied. A mirror element () for the EUV wavelength range associated with the method has a substrate () pre-compacted by hot isostatic pressing. Such a mirror element () is suitable to be provided in an EUV projection exposure system.