The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Apr. 24, 2014
David H. Levy, Rochester, NY (US);
Daniele Margadonna, Ciampino, IT;
Dennis Flood, Oberlin, OH (US);
Wendy G. Ahearn, Rochester, NY (US);
Richard W. Topel, Jr., Rochester, NY (US);
Theodore Zubil, Honeoye Falls, NY (US);
David H. Levy, Rochester, NY (US);
Daniele Margadonna, Ciampino, IT;
Dennis Flood, Oberlin, OH (US);
Wendy G. Ahearn, Rochester, NY (US);
Richard W. Topel, Jr., Rochester, NY (US);
Theodore Zubil, Honeoye Falls, NY (US);
Natcore Technology, Inc., Rochester, NY (US);
Abstract
Systems and methods for producing nanoscale textured low reflectivity surfaces may be utilized to fabricate solar cells. A substrate may be patterned with a resist prior to an etching process that produces a nanoscale texture on the surface of the substrate. Additionally, the substrate may be subjected to a dopant diffusion process. Prior to dopant diffusion, the substrate may be optionally subjected to liquid phase deposition to deposit a material that allows for patterned doping. The order of the nanoscale texture etching and dopant diffusion may be modified as desired to produce post-nano emitters or pre-nano emitters.