The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2016

Filed:

Oct. 29, 2012
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Seiichi Nakatani, Osaka, JP;

Koji Kawakita, Nara, JP;

Susumu Sawada, Osaka, JP;

Yoshihisa Yamashita, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/48 (2006.01); H05K 1/03 (2006.01); H01L 23/498 (2006.01); H05K 3/46 (2006.01); H01L 23/15 (2006.01); H01L 23/373 (2006.01);
U.S. Cl.
CPC ...
H01L 23/49822 (2013.01); H01L 21/4857 (2013.01); H01L 23/15 (2013.01); H01L 23/49827 (2013.01); H05K 1/0306 (2013.01); H05K 1/0313 (2013.01); H05K 3/4673 (2013.01); H05K 3/4682 (2013.01); H01L 23/3731 (2013.01); H01L 2224/16225 (2013.01); H05K 2201/017 (2013.01); H05K 2201/0175 (2013.01); H05K 2203/0126 (2013.01); H05K 2203/0514 (2013.01); H05K 2203/1366 (2013.01);
Abstract

A method for manufacturing a build-up substrate, the build-up substrate comprising an insulating layer and a wiring pattern layer stacked over a circuit substrate, said method comprising the steps of: (i) applying a photoactive metal oxide precursor material to one or both sides of the circuit substrate with a wiring pattern, and drying the applied photoactive metal oxide precursor material to form an insulating film; (ii) forming an opening for a via hole in the insulating film by exposure and development of the insulating film; (iii) applying a heat treatment to the insulating film to convert the insulating film into a metal oxide film, thereby forming a build-up insulating layer of the metal oxide film; and (iv) plating the build-up insulating layer to form via holes in the openings, forming a metal layer on the build-up insulating layer, and etching the metal layer to form a build-up wiring pattern; and (v) repeating the steps from (i) to (iv) at least one time.


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