The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Feb. 28, 2013
Globalfoundries Singapore Pte. Ltd., Singapore, SG;
Qiaoming Cai, Clifton Park, NY (US);
Wurster Kai, Dresden, DE;
Chunyan Xin, Clifton Park, NY (US);
Frank Jakubowski, Dresden, DE;
GLOBALFOUNDRIES SINGAPORE PTE. LTD., Singapore, SG;
Abstract
A semiconductor device and a method for forming a device are presented. A wafer substrate having first and second regions is provided. The second region includes an inner region of the substrate while the first region includes an outer peripheral region from an edge of the substrate towards the inner region. A protection unit is provided above the substrate. The protection unit includes a region having a total width Wdefined by outer and inner rings of the protection unit. The substrate is etched to form at least a trench in the second region of the substrate. The Wof the protection unit is sufficiently wide to protect the first region of the wafer substrate such that the first region is devoid of trench.