The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Mar. 23, 2012
Jun Yamawaku, Yamanashi, JP;
Takafumi Kimura, Yamanashi, JP;
Chishio Koshimizu, Yamanashi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
In the plasma processing apparatus, a processing space S is formed between a susceptorand an upper electrodefacing the susceptor. The plasma processing apparatusincludes a magnetic field generating unit provided at a side of the upper electrodeopposite to the processing space S. The magnetic field generating unit includes a magnetic force line generating unithaving a pair of annular magnet rowsand. The annular magnet rowsandare provided at the side of the upper electrodeopposite to the processing space S and arranged concentrically when viewed from the top. In the magnetic force line generating unit, an angle θ1 formed by axial lines of magnets of the annular magnet rowsandis set to be in a range of about 0°<θ1≦180°.