The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 2016

Filed:

Apr. 18, 2014
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Tomoyuki Morita, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/30 (2006.01); H01J 37/317 (2006.01); H01L 21/268 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 37/20 (2013.01); H01J 37/3005 (2013.01); H01J 37/3177 (2013.01); H01L 21/268 (2013.01); H01J 2237/20292 (2013.01); H01J 2237/31761 (2013.01);
Abstract

A drawing apparatus includes: plural charged particle optical systems arrayed at a pitch in a first direction, each configured to irradiate a substrate with charged particle beams; a stage configured to hold the substrate and be moved relative to the charged particle optical systems in a second direction orthogonal to the first direction; and a controller configured to determine charged particle beams for the drawing with respect to each charged particle optical system so as to satisfy a relation given by SW=Pc/α=Ps/(β where Ps is an array pitch of shot regions in the first direction, SW is a width, in the first direction, of each drawing region by each charged particle optical system, Pc be an array pitch of drawing regions in the first direction, and α and β are natural numbers.


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