The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Aug. 12, 2014
Globalfoundries Inc., Grand Cayman, KY;
Biswanath Senapati, Mechanicville, NY (US);
Jagar Singh, Clifton Park, NY (US);
Karthik Chandrasekaran, Albany, NY (US);
GLOBALFOUNDRIES INC., , KY;
Abstract
Structures and methods to minimize parasitic capacitance in a circuit structure are provided. The structure may include a substrate supporting one or more circuits and one or more metallization layers above the substrate. The metallization layer includes a conductive pattern defined by an array of conductive fill elements, where the conductive fill elements of the array are discrete, electrically isolated elements sized to satisfy, at least in part, a pre-defined minimum area-occupation ratio for a chemical-mechanical polishing of the metallization layer, and to minimize parasitic capacitance within the metallization layer, as well as minimize parasitic capacitance between the metallization layer and the circuit, and if multiple metallization layers are present, between the layers.