The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Jun. 06, 2011
Adrian Celaru, Hauppauge, NY (US);
Todd A. Luse, Kings Park, NY (US);
Ajit P. Paranjpe, Basking Ridge, NJ (US);
Joseph Scandariato, Elmont, NJ (US);
Qingfu Tang, Port Jefferson, NY (US);
Adrian Celaru, Hauppauge, NY (US);
Todd A. Luse, Kings Park, NY (US);
Ajit P. Paranjpe, Basking Ridge, NJ (US);
Joseph Scandariato, Elmont, NJ (US);
Qingfu Tang, Port Jefferson, NY (US);
Veeco Instruments, Inc., Plainview, NY (US);
Abstract
Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.