The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
May. 24, 2013
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto, JP;
Abstract
A thickness monitoring device capable of performing thickness measurement of an object of measurement in real time even when using a relatively narrow band light source. This etching monitoring device (thickness monitoring device) includes a light source which produces measurement light having a predetermined wavelength bandwidth; an array detector which detects, for each wavelength, interference light of measurement light reflected from mask, whereof the thickness changes over time; and data processing unit which computes the thickness of the mask based on change over time of a plurality of single-wavelength components of the interference light detected by the array detector.