The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Jul. 31, 2012
Jozef Brcka, Austin, TX (US);
Jozef Brcka, Austin, TX (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and apparatus are provided for constructing tissue from cells or other objects by application of temporally and spatially controlled electric fields. Electric field applicators expose a substrate () to the electric field controlled to affect the processing medium () to achieve a processing effect on the construction of tissue on the substrate (). Electrical bias is selected to interact with dipole properties of the medium () to control the movement of suspended dielectrophoretic cells or other particles in the medium () or at the substrate (). The motion of suspended particles may be affected to cause suspended particles of different properties to follow different paths in the processing medium (), which may be used to cause the suspended particles to be sorted. The processing medium () and electrical bias may be selected to affect the structure, or orientation, of one or more layers on the substrate ().