The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2016

Filed:

Mar. 14, 2013
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Toshihiro Doi, Naka, JP;

Hideaki Sakurai, Naka, JP;

Kenzo Nakamura, Naka, JP;

Kazunori Igarashi, Naka, JP;

Nobuyuki Soyama, Naka, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09D 1/00 (2006.01); H01L 21/316 (2006.01); C09D 5/23 (2006.01); H01F 41/22 (2006.01); C23C 18/12 (2006.01); H01F 10/20 (2006.01); H01F 41/24 (2006.01);
U.S. Cl.
CPC ...
C09D 5/23 (2013.01); C23C 18/1216 (2013.01); C23C 18/1245 (2013.01); C23C 18/1254 (2013.01); C23C 18/1283 (2013.01); H01F 10/20 (2013.01); H01F 41/22 (2013.01); H01F 41/24 (2013.01);
Abstract

To provide a ferrite thin film-forming composition material that is a composition material for forming a ferrite thin film by using the sol-gel method which can form a thin ferrite thin film having a uniform thickness and, furthermore, has excellent long-term storage stability, a method of forming a ferrite thin film using the above composition material, and a ferrite thin film formed by using the above method. A ferrite thin film-forming composition material is a composition material for forming a NiZn ferrite, CuZn ferrite, or NiCuZn ferrite thin film by using a sol-gel method, in which the composition material is formed by dissolving metallic raw materials in a solvent including acetonitrile, and the fraction of acetonitrile is 30 mass % to 60 mass % with respect to 100 mass % of the composition material.


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