The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Feb. 11, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Marcus E. Interrante, New Paltz, NY (US);

Mario J. Interrante, New Paltz, NY (US);

Katsuyuki Sakuma, Fishkill, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 23/00 (2006.01); H01L 21/56 (2006.01); H01L 23/498 (2006.01); H01L 25/00 (2006.01); H01L 25/065 (2006.01); H01L 21/683 (2006.01); B23K 3/06 (2006.01);
U.S. Cl.
CPC ...
H01L 24/81 (2013.01); B23K 3/0623 (2013.01); H01L 21/563 (2013.01); H01L 21/6835 (2013.01); H01L 23/49822 (2013.01); H01L 23/49827 (2013.01); H01L 24/17 (2013.01); H01L 25/0657 (2013.01); H01L 25/50 (2013.01); H01L 2221/68372 (2013.01); H01L 2224/16057 (2013.01); H01L 2224/16238 (2013.01); H01L 2224/8109 (2013.01); H01L 2224/8121 (2013.01); H01L 2224/81815 (2013.01); H01L 2225/06513 (2013.01); H01L 2225/06517 (2013.01); H01L 2924/1427 (2013.01); H01L 2924/1431 (2013.01); H01L 2924/1434 (2013.01); H01L 2924/2064 (2013.01); H01L 2924/2065 (2013.01); H01L 2924/20106 (2013.01); H01L 2924/20107 (2013.01); H01L 2924/20645 (2013.01); H01L 2924/20646 (2013.01); H01L 2924/20647 (2013.01); H01L 2924/20648 (2013.01); H01L 2924/20649 (2013.01); H01L 2924/20651 (2013.01);
Abstract

An interposer structure containing a first set of solder balls is placed in proximity to a vacuum distribution plate which has a planar contact surface and a plurality of openings located therein. A vacuum is then applied through the openings within the vacuum distribution plate such that the first set of solder balls are suspended within the plurality of openings and the interposer structure conforms to the planar contact surface of the vacuum distribution plate. A semiconductor chip containing a second set of solder balls is tacked to a surface of the interposer structure. A substrate is then brought into contact with a surface of the interposer structure containing the first set of solder balls, and then a solder reflow and underfill processes can be performed. Warping of the interposer structure is substantially eliminated using the vacuum distribution plate mentioned above.


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