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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9223223 B1

PDFFull Text
Date of Patent:
Dec. 29, 2015

Filed:

Nov. 12, 2010

Apparatus for forming fine patterns capable of switching direction of polarization interference pattern in laser scanning method and method of forming fine patterns using the same

Applicants:

Hyug-gyo Rhee, Daejeon, KR;

Yun-woo Lee, Deajeon, KR;

Inventors:

Hyug-Gyo Rhee, Daejeon, KR;

Yun-Woo Lee, Deajeon, KR;

Assignee:

KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE, Daejeon, KR;

Attorney:

Allen, Dyer, Doppelt, Milbrath & Gilchrist, P.A.

Primary Examiner:

Peter B Kim

Assistant Examiner:

Michelle Iacoletti

Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70308 (2013.01); G03F 7/2053 (2013.01); G03F 7/70141 (2013.01); G03F 7/70191 (2013.01);
Abstract

An apparatus for forming fine patterns by employing polarization interference in a laser scanning method comprises a laser generator; a calcite wave plate configured to refract at least one of the S wave and the P wave, polarized by the polarization plate, an analyzer configured to make coincident with each other the polarization directions of the S wave and the P wave having the paths spaced apart from each other by the calcite wave plate; an exposure lens; an exposure head; an X stage; and a rotation stage configured to move the substrate mounting unit around a Z axis which is a vertical axis.

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Rhee, Hyug-Gyo. (2015). Apparatus for forming fine patterns capable of switching direction of polarization interference pattern in laser scanning method and method of forming fine patterns using the same (U.S. Patent No. 9223223). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9223223

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